On April 16, as the crane slowly rose, the first domestic hydrofluoric acid cleaning (HF Cleaner) equipment independently developed and produced by Suzhou Jingzhou Equipment Technology Co., Ltd. was hoisted to the docking platform at the client's end and then pushed into the factory. , moved in smoothly.
Hydrofluoric acid cleaning is a key link in the display process. Its cleaning effect directly affects the final performance, efficiency and stability of the device structure, and is related to the yield rate of the final product. Hydrofluoric acid cleaning not only removes impurities on the surface of the active layer but also passivates the surface, thereby reducing the adsorption capacity of interface impurities. The requirements for surface cleanliness are very strict and theoretically does not allow the presence of any particles, metal ions, or organic adhesives. Attached, water vapor and oxide layers require atomic-level flatness on the surface to ensure the process reliability of the post-processing process.
Post time: May-13-2024